Yuan Yi, Yang Baoxiong, Bai Yuanqiang, Wang Jianjun, Lu Fanxiu. Microstructure of Diamond Thin Films by Microwave Plasma CVD[J]. Chinese Journal of Engineering, 1994, 16(3): 245-249. DOI: 10.13374/j.issn1001-053x.1994.03.010
Citation: Yuan Yi, Yang Baoxiong, Bai Yuanqiang, Wang Jianjun, Lu Fanxiu. Microstructure of Diamond Thin Films by Microwave Plasma CVD[J]. Chinese Journal of Engineering, 1994, 16(3): 245-249. DOI: 10.13374/j.issn1001-053x.1994.03.010
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Microstructure of Diamond Thin Films by Microwave Plasma CVD

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  • The morphology and the microstructure of six different dianond films deposited by microwave plasma CVD have been studied by SEM and TEM.The observations of microstructure indicate that high dencity microtwins are formed during the(111)planes growth and a few of crystal defects are formed during the(100) planes growth.
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